Jensen Huang stated that China can achieve advanced domestic lithography by 2030

At the All-In Summit, Jensen Huang assessed that China will be able to produce its own advanced lithography systems by 2030. He also believes that once the technology matures, China has strong mass production capabilities, and it is only a matter of time before domestic equipment enters local wafer fabs.

This assessment is more optimistic than that of Zeiss. Frank Rohmund, the head of Zeiss Semiconductor, recently stated that it may take about 15 more years for China to produce its own EUV lithography machines. Zeiss is a core supplier of ASML's EUV optical systems. The host asked about advanced lithography systems, without specifically limiting it to EUV, and Jensen Huang did not further specify that it was EUV in his response.